Silicon Tetrafluoride Gas (SiF4) is a colorless, non-flammable, and highly reactive gas composed of one silicon atom bonded to four fluorine atoms. SiF4 is known for its high reactivity, making it an indispensable component in several chemical processes. Silicon Tetrafluoride is commonly used for etching and deposition processes in semiconductor manufacturing. Additionally, SiF4 is employed in optical thin film coatings, enhancing the performance and durability of optical components. It contributes to anti-reflective coatings, optical filters, and beam splitters.
Disclaimer:
Please consult our Material Safety Data Sheet (MSDS) and follow all recommended safety protocols and guidelines when handling Silicon Tetrafluoride. Misuse or mishandling of this chemical can result in serious health risks and environmental hazards.
Note:
This product page is intended to provide an informative overview of Silicon Tetrafluoride. For specific inquiries, technical details, or orders, please contact our sales team.
Note: Always adhere to industry-specific safety guidelines and consult with professionals for proper handling, storage, and usage of pressurized gases.
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