Trifluoromethanehc-23 | Metro Welding Supply Corp.

ABOUT THIS PRODUCT

Trifluoromethane, also known by its chemical formula HC-23, is a colorless, odorless, and non-flammable gas that belongs to the family of hydrofluorocarbons (HFCs). It is composed of three fluorine atoms bonded to a single carbon atom, giving it the chemical structure CF₃H. Trifluoromethane is commonly used in various industrial applications due to its unique chemical properties. It is employed as a cleaning agent and etchant in semiconductor fabrication, playing a crucial role in the production of electronic components. It also exhibits excellent dielectric properties, making it valuable in applications such as electronics manufacturing, where it is used as a dielectric medium.

10 KEY CHARACTERISTICS

1. Chemical Stability: Trifluoromethane is highly stable, meaning it does not readily undergo chemical reactions under normal conditions. This stability contributes to its reliability in diverse applications.
2. Non-Flammable: It is non-flammable, which means it does not support combustion. This property enhances safety in handling, storage, and usage.
3. High Dielectric Strength: Trifluoromethane exhibits excellent dielectric properties, making it suitable for use as an insulating medium in electrical applications, such as in capacitors and high-voltage equipment.
4. Low Toxicity: Trifluoromethane is considered to have low toxicity, posing minimal immediate health risks to humans when handled appropriately. However, as with any gas, proper handling procedures should be followed.
5. High Heat Capacity: It has a relatively high heat capacity, making it useful in applications where temperature control or heat transfer is critical, such as in certain industrial cooling processes.
6. Low Boiling Point: Trifluoromethane has a low boiling point, allowing it to vaporize easily at relatively low temperatures. This property is advantageous in applications like refrigeration and cryogenics.
7. Chemical Inertness: It is chemically inert under most conditions, meaning it does not readily react with other substances. This inertness makes it suitable for applications where a non-reactive environment is needed.
8. Low Global Warming Potential (GWP): Trifluoromethane is considered to have a low global warming potential compared to some other greenhouse gases. However, it's important to note that it still contributes to global warming, and its use should be regulated and minimized.
9. Electronic Grade Purity: In some applications, such as semiconductor manufacturing, ultra-high purity Trifluoromethane is required to ensure the quality and performance of electronic components.
10. Regulatory Considerations: Due to environmental concerns and regulations, the use and handling of Trifluoromethane are subject to specific guidelines and restrictions. Compliance with these regulations is crucial to minimize its impact on the environment.

10 COMMON USES

1. Refrigeration and Air Conditioning: Trifluoromethane is used as a refrigerant in cooling systems, particularly in commercial and industrial settings. It helps regulate temperature in air conditioning units and refrigeration equipment.
2. Semiconductor Manufacturing: In the electronics industry, Trifluoromethane is employed as a cleaning agent and etchant during the production of semiconductor devices. It aids in removing contaminants and shaping semiconductor materials.
3. Dielectric Medium in High-Voltage Equipment: Due to its excellent dielectric properties, Trifluoromethane is utilized as an insulating medium in high-voltage equipment like capacitors and gas-insulated switchgear.
4. Heat Transfer Applications: Its high heat capacity and low boiling point make Trifluoromethane suitable for applications where efficient heat transfer is crucial, such as in certain industrial processes and cooling systems.
5. Fire Suppression Systems: Trifluoromethane is used in fire suppression systems, particularly in environments where water-based systems may cause damage, such as in server rooms, data centers, and laboratories.
6. Plasma Etching in Semiconductor Fabrication: It is employed as a precursor gas in plasma etching processes, where it aids in the precise patterning and etching of semiconductor materials.
7. Dental Anesthesia (Historically): Trifluoromethane was historically used as a dental anesthetic due to its mild sedative properties. However, it has largely been replaced by more modern anesthetics.
8. Medical Aerosol Propellants (Historically): In the past, Trifluoromethane was used as a propellant in medical aerosol formulations. However, its use in this capacity has decreased due to environmental concerns.
9. Laboratory Research: Researchers may use Trifluoromethane in laboratory settings for specialized experiments or processes that require its unique chemical properties.
10. Chemical Synthesis: Trifluoromethane can serve as a reagent in certain chemical reactions, contributing its fluorine atoms to the synthesis of specific compounds.