Di Chlorosilane (Dichlorosilane) | Metro Welding Supply Corp.

ABOUT THIS PRODUCT

Di Chlorosilane Gas, commonly known as Dichlorosilane, is a vital chemical compound widely used in various industrial applications. Comprising two chlorine atoms and one silicon atom, it plays a crucial role in the production of high-quality silicon materials, semiconductors, and other essential electronics components. Its versatile nature makes it an indispensable element in the electronics and semiconductor industries.

10 KEY CHARACTERISTICS

1. Chemical Formula: Di Chlorosilane gas has the chemical formula SiH2Cl2, indicating that it consists of one silicon atom (Si) and two chlorine atoms (Cl).
2. Molecular Weight: Its molecular weight is approximately 313-834-1660 g/mol, making it a relatively light compound.
3. Physical State: Di Chlorosilane is a colorless, flammable, and highly reactive gas at room temperature and pressure. It may liquefy under certain conditions.
4. Reactivity: It is highly reactive and can readily undergo various chemical reactions, making it a valuable precursor in the production of silicon and related materials.
5. Boiling and Melting Points: Di Chlorosilane boils at approximately -22.2°C 313-834-1660°F) and does not have a well-defined melting point under standard conditions due to its gaseous state.
6. Purity Levels: Commercially available Di Chlorosilane is typically produced with high levels of purity to meet the stringent requirements of the semiconductor and electronics industries.
7. Stability: While relatively stable under controlled conditions, Di Chlorosilane can decompose when exposed to heat or other reactive substances, making proper storage and handling crucial.
8. Solubility: It is sparingly soluble in water, meaning it does not readily dissolve in aqueous solutions.
9. Safety Considerations: Di Chlorosilane is considered hazardous and should be handled with care. It poses risks of flammability, inhalation hazards, and skin/eye irritation. Proper safety protocols and equipment are essential when working with this gas.
10. Applications: Di Chlorosilane is primarily used as a precursor in the production of high-purity silicon for semiconductors, solar cells, and other electronics applications. It is also employed in chemical vapor deposition processes for thin film coatings and in the manufacturing of various optoelectronic devices.

10 COMMON USES

1. Silicon Production: Di Chlorosilane is a key precursor in the production of high-purity silicon used in various electronic devices, such as integrated circuits, transistors, and diodes.
2. Semiconductor Manufacturing: It is crucial in the production of silicon wafers, which serve as the foundation for semiconductor devices like microchips and photovoltaic cells.
3. Thin Film Deposition: Used in processes like Chemical Vapor Deposition (CVD), it enables the creation of uniform and high-quality thin films on substrates, which are essential in microelectronics.
4. Solar Cell Production: Di Chlorosilane is employed in the manufacturing of solar cells, contributing to the renewable energy sector by converting sunlight into electricity.
5. LEDs and Optoelectronic Devices: It plays a role in producing light-emitting diodes (LEDs), optical fibers, and other optoelectronic components used in displays, communications, and lighting systems.
6. Fiber Optics: Used in the production of optical fibers, it helps transmit data over long distances with minimal signal loss, making it vital in telecommunications.
7. Chemical Synthesis: Di Chlorosilane is utilized in various chemical reactions, including the synthesis of organosilicon compounds, which find applications in pharmaceuticals, plastics, and coatings.
8. Hydrogen Production: It can be used in processes for generating hydrogen gas, which is a crucial energy carrier and feedstock in various chemical industries.
9. Surface Modification: Di Chlorosilane can be used to modify the surfaces of materials, enhancing their properties for specific applications, such as in adhesives, coatings, and composites.
10. Gas Phase Processes: Due to its gaseous state, Di Chlorosilane is compatible with gas phase processes like etching and plasma deposition, enabling precise control over material properties.