Silicon Tetrafluoride | Metro Welding Supply Corp.

ABOUT THIS PRODUCT

Silicon Tetrafluoride Gas (SiF4) is a colorless, non-flammable, and highly reactive gas composed of one silicon atom bonded to four fluorine atoms. SiF4 is known for its high reactivity, making it an indispensable component in several chemical processes. Silicon Tetrafluoride is commonly used for etching and deposition processes in semiconductor manufacturing. Additionally, SiF4 is employed in optical thin film coatings, enhancing the performance and durability of optical components. It contributes to anti-reflective coatings, optical filters, and beam splitters.

10 KEY CHARACTERISTICS

1. Chemical Formula: SiF4 - Silicon Tetrafluoride consists of one silicon (Si) atom bonded to four fluorine (F) atoms.
2. Physical State: It is a colorless, non-flammable gas at room temperature and pressure.
3. Density: Silicon Tetrafluoride has a density greater than that of air, which means it will tend to sink and accumulate at lower levels if released into the atmosphere.
4. High Reactivity: SiF4 is highly reactive due to the presence of four fluorine atoms. It readily participates in chemical reactions, making it a valuable compound for various industrial processes.
5. Boiling Point: Silicon Tetrafluoride has a boiling point of approximately -86.25 degrees Celsius 313-450-9300 degrees Fahrenheit), which is well below room temperature.
6. Solubility: It is sparingly soluble in water, which means it has limited ability to dissolve in aqueous solutions.
7. Corrosive Nature: SiF4 is corrosive to certain metals and materials. It may react with metals to form metal fluorides.
8. Electronic Grade Purity: In high-tech industries like semiconductor manufacturing, electronic grade Silicon Tetrafluoride is required. It undergoes additional purification steps to meet strict purity standards.
9. Etching and Deposition: Silicon Tetrafluoride is commonly used for etching and deposition processes in the semiconductor industry. It can selectively remove or deposit thin films on silicon wafers.
10. Toxicity and Safety Considerations: While SiF4 is not considered highly toxic, it can pose risks if inhaled in high concentrations. Proper handling and safety measures, including the use of adequate ventilation and personal protective equipment, are crucial when working with this gas.

10 COMMON USES

1. Semiconductor Manufacturing: SiF4 is a crucial component in the production of integrated circuits and microchips. It is used for etching and deposition processes to create patterns and layers on silicon wafers.
2. Optical Coatings: SiF4 is employed in the production of optical coatings for lenses, mirrors, and other optical components. It enhances the performance and durability of optical systems.
3. Chemical Synthesis: It serves as a precursor in the synthesis of various silicon-containing compounds used in the chemical industry.
4. Plasma Etching: SiF4 is used in plasma etching processes to selectively remove material from a substrate. This is particularly important in semiconductor fabrication.
5. Ion Implantation: It is used in the ion implantation process, where ions are accelerated and implanted into a semiconductor material to modify its properties.
6. Silicon Deposition: SiF4 can be used for chemical vapor deposition (CVD) processes to deposit thin films of silicon onto a substrate, such as silicon wafers.
7. Fluorination Reactions: SiF4 can be used as a fluorinating agent in various chemical reactions, enabling the introduction of fluorine atoms into organic and inorganic compounds.
8. Gas Discharge Lighting: SiF4 is used in the production of fluorescent lamps and other gas discharge lighting systems. It can be part of the gas mixture used to produce light.
9. Metal Smelting and Refining: It is utilized in some metallurgical processes for refining and purifying certain metals, particularly in the production of high-purity silicon.
10. Laboratory Research: SiF4 is used in research laboratories for various experimental purposes, including its role as a source of fluorine in chemical reactions.